Ti─Si─N thin films exhibiting a near-zero temperature coefficient of resistivity (0.05 ppm K−1) across 80–420 K is developed for precision electronics. Achieved through atomic layer deposition, the f...

The etching of ZnO thin films using acetylacetone (Hacac) doses with long exposure times, followed by purging and subsequent exposure to O2 plasma, is studied i

Thin films and coatings based on Group 6 metal tungsten (W) have garnered intense interest for applications including catalysis, lubrication, and solar energy. Due to its selectivity and conformality,...